Inline Acid Polishing Equipment
Etching/polishing,cleaning and drying of mono/multi crystalline solar cells.
Water layer protection→Etching/Polishing→Alkaline cleaning→Acid Cleaning→Drying.
· High Throughput: 5-lane 4500pcs/h; 10-lane 8000pcs/h.
· Excellent Uniformity, long bath lifetime.
· Various additives or mixed additives technology.
· Wafer thickness handling capability up to 120μm
· Quick inline bath change.
· Suitable for rear side polishing and with low chemical consumption
· Suitable with MES ; Inline weight testing is optional.
· Compatible with acid polish function.